A Brief Review of Heavy-Ion Radiation Degradation and Failure of Silicon UMOS Power Transistors

نویسندگان

  • Kenneth F. Galloway
  • Mostafa Bassiouni
چکیده

Silicon VDMOS power MOSFET technology is being supplanted by UMOS (or trench) power MOSFET technology. Designers of spaceborne power electronics systems incorporating this newer power MOSFET technology need to be aware of several unique threats that this technology may encounter in space. Space radiation threats to UMOS power devices include vulnerabilities to SEB, SEGR, and microdose. There have been relatively few studies presented or published on the effects of radiation on this device technology. The S-O-A knowledge of UMOS power device degradation and failure under heavy-ion exposure is reviewed.

برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

ثبت نام

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

منابع مشابه

A new circuit model for the Parameters in equations of low power Hodgkin-Huxley neuron cell

In this paper, α and β parameters and gating variables equations of Hodgkin-Huxley neuron cell have been studied. Gating variables show opening and closing rate of ion flow of calcium and potassium in neuron cell. Variable functions α and β, are exponential functions in terms of u potential that have been obtained by Hodgkin and Huxley experimentally to adjust the equations of neural cells. In ...

متن کامل

Single-event Gate Rupture in Power Mosfets: a New Radiation Hardness Assurance Approach

Title of Document: SINGLE-EVENT GATE RUPTURE IN POWER MOSFETS: A NEW RADIATION HARDNESS ASSURANCE APPROACH Jean-Marie Lauenstein, Ph.D. Candidate, 2011 Directed By: Professor Neil Goldsman, Department of Electrical and Computer Engineering Almost every space mission uses vertical power metal-semiconductor-oxide field-effect transistors (MOSFETs) in its power-supply circuitry. These devices can ...

متن کامل

Modeling of Manufacturing of Field-Effect Heterotransistors without P-n-junctions to Optimize Decreasing their Dimensions

It has been recently shown that manufacturing p-n-junctions, field-effect and bipolar transistors, thyristors in a multilayer structure by diffusion or ion implantation with the optimization of dopant and/or radiation defects leads to increase the sharpness of p-n-junctions (both single p-n-junctions and p-n-junctions framework their system). Due to the optimization, one can also obtain increas...

متن کامل

The comparison of radiation hardness of heterojunction SiGe and conventional silicon bipolar transistors

The results of the X-ray radiation impact on heterojunction SiGe and conventional silicon bipolar transistors are presented. Oxide thickness over the emitter-base junction depletion region determines the radiation hardness of the bipolar transistors. In this article, the estimation of the rate of radiation degradation of electrical parameters for conventional silicon devices and SiGe-transistor...

متن کامل

Design and Optimization of Input-Output Block using Graphene Nano-ribbon Transistors

In the electronics industry, scaling and optimization is final goal. But, according to ITRS predictions, silicon as basic material for semiconductors, is facing physical limitation and approaching the end of the path. Therefore, researchers are looking for the silicon replacement. Until now, carbon and its allotrope, graphene, look to be viable candidates. Among different circuits, IO block is ...

متن کامل

ذخیره در منابع من


  با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید

برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

ثبت نام

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

عنوان ژورنال:

دوره   شماره 

صفحات  -

تاریخ انتشار 2014